Ti:Sapphire Laser HR Mirror @ 800 nm - 45° AOI - Ø60 mm Mounted
Mounted high-reflectivity dielectric mirror for Ti:Sapphire laser resonators, 800 nm beam steering, femtosecond laser layouts and laboratory optical systems.
Indicative shipping
| European Union | EUR 12 |
| United States | USD 60 |
| Rest of the world | Email me |
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Product Description
High-reflectivity dielectric mirror optimized for Ti:Sapphire laser systems centered at 800 nm, designed for 45° angle of incidence. The optic is supplied mounted in a protective Ø60 mm aluminum frame.
The coating is a hard HfO₂ / SiO₂ dielectric multilayer manufactured by electron-beam PVD on a fused silica substrate. This makes the mirror suitable for demanding laboratory laser layouts where low absorption, good thermal stability and high reflectivity are important.
- HR: R > 99% @ 800 nm
- AOI: 45°
- Substrate: fused silica
- Coating: HfO₂ / SiO₂ hard dielectric multilayer
- Mount: aluminum protective frame, Ø60 mm
Technical Specifications
| Product type | High-reflectivity Ti:Sapphire laser mirror |
| Central wavelength | 800 nm |
| Angle of incidence | 45° |
| Reflectivity | R > 99% @ 800 nm |
| Diameter | 60 mm mounted |
| Substrate | Fused silica |
| Coating type | Hard dielectric HfO₂ / SiO₂ multilayer |
| Manufacturing | Electron-beam PVD optical coating |
| Origin | Manufactured in EU |
Typical Use
- Folding mirror in Ti:Sapphire laser resonators
- Beam steering around 800 nm at 45° AOI
- Femtosecond laser layouts and CPA optical paths
- Regenerative amplifier routing experiments
- CW Ti:Sapphire laboratory systems
- Research optical benches and prototyping setups
Ordering Notes
The listed price is for one mounted mirror and does not include shipping. The shipping values above are indicative; the final total is confirmed by email before payment.
- Please mention the product name or file/page name in your email.
- For multiple items, combined shipping may be possible.
- Payment can be made after confirmation by PayPal, Revolut or bank transfer.